French SME, created in 2013 is specialized in plasma deposition and etching techniques. Its purpose is to study, design and realize plasma etching and deposition equipment dedicated to research and development and production for the semiconductor industry, LEDs (Light Emitting Diode) OLED (Organic Light Emitting Diode), MEMS (Microelectromechanical systems) and related industry.
The technologies offered by the company include RIE (Reactive Iode Etching), ICP (Inductively Coupled Plasma), DRIE (Deep Reactive Ion Etching), ICP-CVD (Inductively Coupled Plasma-Chemical Vapor Deposition), PECVD (Plasma Enhanced Chemical Vapor Deposition), and ALE/ALD (Atomic Layer Etching/Atomic Layer Deposition).
They provide the etching and deposition process that allow their customers to make new materials.
The company already works with an independent network in Asia (Taiwan, China, Korea and Malaysia) and they want now to expand their distribution in European countries through distribution agreement.
90% of their turnover is international.
Relevant application sectors for the company are : optoelectronics, failure analysis, packaging, power devices, wireless communication and integrated optics.