Enterprise Europe Network

Microfabrication of multilayer atom and ion traps

Country of origin:
Country: 
GERMANY
Opportunity:
External Id: 
TODE20190328005
Published
28/03/2019
Last update
21/09/2020
Expiration date
03/04/2021

Keywords

Partner keyword: 
Micro and Nanotechnology related to Electronics and Microelectronics
High Frequency Technology, Microwaves
Printed circuits and integrated circuits
Quantum Informatics
Microengineering and nanoengineering
Scientific computers
Other analytical and scientific instrumentation
Manufacture of computers and peripheral equipment
Manufacture of instruments and appliances for measuring, testing and navigation
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Summary

Summary: 
A German research institute has developed a process for the microfabrication of multilayer atom and ion traps. Microstructured atom and ion traps are a promising platform for quantum sensors and are well suited to implement future quantum computers. The institute has developed several techniques to manufacture planarized thick film structures that fulfill the stringent requirements set by atom and ion traps. The institute is looking for licensees and technical cooperation agreements.

Description

Description: 

A research institute based in Germany and active in metrology has developed a process for the microfabrication of multilayer atom and ion traps. Neutral and charged atoms (ions) can be stored above the trap surface by means of inhomogeneous magnetic or electric fields. One of the essential prerequisites to increase the number of controlled atoms and qubits is a microstructured trap that allows the integration of a large number of signals to be applied (e.g. by integrating microwave conductors). This is achieved by means of stacked structures, like those of a multilayer printed circuit board. The trap developed at the institute consists of a set of thick conductive layers separated from each other by a thick dielectric layer and selectively connected with each other. In principle, the number of metallic-dielectric layers is arbitrary, since each of these layers is flatten by a high-precision global planarization method. The whole process comprises only materials compatible with the stringent requirements of atom and ion traps arising from the ultra-high vacuum environment and from operation at low temperatures. Moreover, the high-frequency characteristics of these structures are excellent. The new proces allows a broad variety of geometries, functionalities and applications for microstructured atom and ion traps.
The institute is looking for licensees and technical cooperation agreements for a joint of further development into individual operating models.

Advantages & innovations

Cooperation plus value: 
Multilayer neutral atom and ion traps based on multilayer structures produced with the offered technology: - Setup can be scaled for versatile applications - Trapping of neutral, charged atoms and molecules - Robust under ultra-high vacuum; temperature range from 4 K up to more than +250 °C

Stage of development

Cooperation stage dev stage: 
Under development/lab tested

Partner sought

Cooperation area: 
The method can be applied in the fields of microstructured ion and atom traps, quantum data processing and quantum sensor systems. It is suitable to manufacture large numbers of specimens as well as customized samples in cooperation with third parties. The institute looks for licensees and partners for research cooperations, interested in the commercial use of the system as licensee. If necessary the institute offers technical cooperations for a joint of further development of the lab tested system.

Dissemination

Dissemination sector group : 
Dissemination preferred : 
Austria, France, Germany, Italy, Switzerland, United Kingdom

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Microfabrication of multilayer atom and ion traps