Established research team has developed a new innovation in the field of industrial equipment. High Power Impuls Magnetron Sputtering (HiPIMS) is thin film deposition from standard magnetrons using pulsed plasma discharges. The high degree of ionization of the deposition material leads to the growth of smooth and dense elemental as well as reactively deposited compound films, and enable control over their phase composition, microstructure, as well as mechanical and optical properties.
Furthermore, HiPIMS leads to improved film adhesion, enabling deposition of uniform films on complex-shaped substrates, and a decreased deposition temperature.
Pulse plasma generator controls electromagnetic plasma field and thus even the sputtering process of metallic layer. Burning discharge leads to cathode bombardment by positive ions and creation of metallic vapour that consequently condense on anode- what creates thin metallic layer. At the market is a deficiency of affordable IPG for laboratories. This IPG has been developed and built at R&D institution in order to create thin metallic layers and their oxides. The plasma discharge with high stability is without any oscillation due to its unique way (method) of stabilisation of high-power impulse discharge. R&D institution is seeking an industrial partner for licensing for the further development and commercionalization of this technology.